Journal Articles
Modeling the Impact of Incomplete Conformality During Atomic Layer Processing (invited) Journal Article
In: Solid-State Electronics, vol. 211, pp. 108816, 2024, ISSN: 0038-1101.
A Two-Step Dry Etching Model for Non-Uniform Etching Profile in Gate-All-Around Field-Effect Transistor Manufacturing Journal Article
In: Small, 2024, ((Accepted)).
Electron-Beam-Induced Adatom-Vacancy-Complexes in Mono- and Bilayer Phosphorene Journal Article
In: 2024.
Numerical Simulations of Space Charge Waves Amplification Using Negative Differential Conductance in Strained Si/SiGe at 4.2K Journal Article
In: Crystals, vol. 13, iss. 9, no. 1398, pp. 1-11, 2023.
A Theoretical Study of Armchair Antimonene Nanoribbons in the Presence of Uniaxial Strain Based on First-Principles Calculations Journal Article
In: ACS Applied Electronic Materials, vol. 5, iss. 8, pp. 4514–4522, 2023.
In: ECS Journal of Solid State Science and Technology, vol. 12, no. 076014, pp. 1-13, 2023.
The role of Thermalisation in the Cooling Dynamics of Hot Carrier Solar Cells Journal Article
In: Solar RRL, vol. 7, iss. 13, no. 2300140, pp. 1-9, 2023.
Effect of Mask Geometry Variation on Plasma Etching Profiles Journal Article
In: Micromachines, vol. 14, iss. 3, no. 665, pp. 1-16, 2023, (Invited).
Modeling Non-Ideal Conformality during Atomic Layer Deposition in High Aspect Ratio Structures Journal Article
In: Solid-State Electronics, vol. 201, no. 108584, 2023.
DTCO Flow for Air Spacer Generation and its Impact on Power and Performance at N7 Journal Article
In: Solid-State Electronics, vol. 199, no. 108527, 2023.
Application of Two-Dimensional Materials towards CMOS-Integrated Gas Sensors Journal Article
In: Nanomaterials, vol. 12, iss. 20, no. 3651-1--3651-60, 2022, (Invited).
Improving stability in two-dimensional transistors with amorphous gate oxides by Fermi-level tuning Journal Article
In: Nature Electronics, vol. 5, pp. 356–366, 2022.
Editorial for the Special Issue on Miniaturized Transistors, Volume II Journal Article
In: Micromachines, vol. 13, iss. 4, pp. 603-1–603-4, 2022.
Impact of Plasma Induced Damage on the Fabrication of 3D NAND Flash Memory Journal Article
In: Solid-State Electronics, vol. 192, pp. 108261-1–108261-9, 2022, (invited).
Perspective of 2D Integrated Electronic Circuits: Scientific Pipe Dream or Disruptive Technology? Journal Article
In: Advanced Materials, vol. Early View, pp. 2201082-1–2201082-23, 2022, (invited).
Superior Sensitivity and Optical Response of Blue Phosphorene and Its Doped Systems for Gas Sensing Applications Journal Article
In: ACS Omega, vol. 6, no. 29, pp. 18770–18781, 2021.
Theoretical Examination of Thermo-Migration in Novel Platinum Microheaters Journal Article
In: Microelectronics Reliability, vol. 123, pp. 114219-1–114219-14, 2021.
Microstructure and Granularity Effects in Electromigration Journal Article
In: IEEE Journal of the Electron Devices Society, vol. 9, pp. 476–483, 2021, (invited).
Geometric Advection and Its Application in the Emulation of High Aspect Ratio Structures Journal Article
In: Computer Methods in Applied Mechanics and Engineering, vol. 386, pp. 114196-1–114196-22, 2021.
A Method for Simulating the Influence of Grain Boundaries and Material Interfaces on Electromigration Journal Article
In: Microelectronics Reliability, vol. 97, pp. 38–52, 2019.
Thermo-Electro-Mechanical Simulation of Semiconductor Metal Oxide Gas Sensors Journal Article
In: Materials, vol. 12, no. 15, pp. 2410-1–2410-37, 2019, (invited).
Improved Sensing Capability of Integrated Semiconducting Metal Oxide Gas Sensor Devices Journal Article
In: Sensors, vol. 19, no. 2, pp. 374-1–374-14, 2019.
Editorial for the Special Issue on Miniaturized Transistors Journal Article
In: Micromachines, vol. 10, no. 5, pp. 1–3, 2019.
Review-System-on-Chip SMO Gas Sensor Integration in Advanced CMOS Technology Journal Article
In: Journal of the Electrochemical Society, vol. 165, no. 16, pp. 862–879, 2018.
Modeling of Gate Stack Patterning for Advanced Technology Nodes: A Review Journal Article
In: Micromachines, vol. 9, no. 12, pp. 631-1–631-31, 2018, (invited).
Modeling and Simulation of Novel Semiconducting Metal Oxide Gas Sensors for Wearable Devices Journal Article
In: IEEE Sensors Journal, vol. 18, no. 5, pp. 1960–1970, 2018.
Electro-Thermal Simulation & Characterization of a Microheater for SMO Gas Sensors Journal Article
In: Journal Of Microelectromechanical Systems, vol. 27, no. 3, pp. 529–537, 2018.
Framework to Model Neutral Particle Flux in Convex High Aspect Ratio Structures using One-Dimensional Radiosity Journal Article
In: Solid-State Electronics, vol. 128, no. 2, pp. 141–147, 2017, (invited).
Stress Considerations for System-on-Chip Gas Sensor Integration in CMOS Technology Journal Article
In: IEEE Transactions on Device and Materials Reliability, vol. 16, no. 4, pp. 483–495, 2016.
Stress in Three-Dimensionally Integrated Sensor Systems Journal Article
In: Microelectronics Reliability, vol. 61, pp. 3–10, 2016.
In: Microelectronic Engineering, vol. 137, pp. 141–145, 2015.
Performance and Stress Analysis of Metal Oxide Films for CMOS-Integrated Gas Sensors Journal Article
In: Sensors, vol. 15, no. 4, pp. 7206–7227, 2015.
Intrinsic Stress Analysis of Tungsten-Lined Open TSVs Journal Article
In: Microelectronics Reliability, vol. 55, no. 9-10, pp. 1843–1848, 2015.
The Effects of Etching and Deposition on the Performance and Stress Evolution of Open Through Silicon Vias Journal Article
In: Microelectronics Reliability, vol. 54, no. 9-10, pp. 1953–1958, 2014.
Methods of Simulating Thin Film Deposition Using Spray Pyrolysis Techniques Journal Article
In: Microelectronic Engineering, vol. 117, pp. 57–66, 2014.
Modeling the Growth of Tin Dioxide using Spray Pyrolysis Deposition for Gas Sensor Applications Journal Article
In: IEEE Transactions on Semiconductor Manufacturing, vol. 27, no. 2, pp. 269–277, 2014.
A Method for Simulating Atomic Force Microscope Nanolithography in the Level Set Framework Journal Article
In: Microelectronic Engineering, vol. 107, pp. 23–32, 2013.
A Method for Simulating Spray Pyrolysis Deposition in the Level Set Framework Journal Article
In: Engineering Letters, vol. 21, no. 4, pp. 224–240, 2013, (invited).
Books
Miniaturized Transistors, Volume II Book
MDPI, 2022, ISBN: 978-3-0365-4169-3.
MDPI, 2019, ISBN: 978-3-03921-010-7.
Incollections
Electro-Thermo-Mechanical Simulation of Semiconductor Metal Oxide Gas Sensors Incollection
In: M. Iqubal Khan (Ed.): Prime Archives in Material Science, vol. 3, pp. 1–38, Vide Leaf, 2021, ISBN: 978-81-953047-9-0, (invited).
Impact of High-Aspect-Ratio Etching Damage on Selective Epitaxial Silicon Growth in 3D NAND Flash Memory Incollection
In: Bogdan Cretu (Ed.): Proceedings of the 2021 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), pp. 1–4, IEEE, 2021, ISBN: 978-1-6654-3745-5.
Electro-Thermal-Mechanical Modeling of Gas Sensor Hotplates Incollection
In: Willem Dirk Driel; Oliver Pyper; Cornelia Schumann (Ed.): Sensor Systems Simulations, pp. 17–72, Springer International Publishing, 2020, ISBN: 978-3-030-16577-2.
Modeling of Gate Stack Patterning for Advanced Technology Nodes: A Review Incollection
In: Lado Filipovic; Tibor Grasser (Ed.): Miniaturized Transistors, pp. 105–135, MDPI, 2019, ISBN: 978-3-03921-010-7, (invited).
System-on-Chip Sensor Integration in Advanced CMOS Technology Incollection
In: J. A. Martino; J. -P. Raskin; Siegfried Selberherr; H. Ishii; Francisco Gamiz; B. -Y. Nguyen; A. Yoshino (Ed.): Advanced CMOS-Compatible Semiconductor Devices 18, Vol. 85, No. 8, pp. 151–162, ECS Transactions, 2018, ISBN: 978-1-62332-488-9, (invited).
Unified Feature Scale Model for Etching in SF6 and Cl Plasma Chemistries Incollection
In: Francisco Gamiz; Viktor Sverdlov; Carlos Sampedro; Luca Donetti (Ed.): Proceedings of the 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), pp. 177–180, IEEE, 2018, ISBN: 978-1-5386-4812-4.
Using One-Dimensional Radiosity to Model Neutral Particle Flux in High Aspect Ratio Holes Incollection
In: Viktor Sverdlov; Siegfried Selberherr (Ed.): Proceedings of the 2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), pp. 120–123, IEEE, 2016, ISBN: 978-1-4673-8608-1.
Stress Considerations in Thin Films for CMOS-Integrated Gas Sensors Incollection
In: Y. Omura; J. A. Martino; J. -P. Raskin; Siegfried Selberherr; H. Ishii; Francisco Gamiz; B. -Y. Nguyen (Ed.): Advanced CMOS-Compatible Semiconductor Devices 17, Vol.66, No.5, pp. 243–250, ECS Transactions, 2015, ISBN: 978-1-62332-238-0.
Modeling and Analysis of Spray Pyrolysis Deposited SnO2 Films for Gas Sensors Incollection
In: Gi-Chul Yang; Sio-Long Ao; Len Gelman (Ed.): Transactions on Engineering Technologies, pp. 295–310, Springer, 2014, ISBN: 978-94-017-8831-1.
A Monte Carlo Simulator for Non-contact Mode Atomic Force Microscopy Incollection
In: Ivan Lirkov; S. Margenov; J. Wasniewski (Ed.): Large-Scale Scientific Computing, Lecture Notes in Computer Science, vol. 7116, pp. 447–454, Springer Berlin Heidelberg, 2012, ISBN: 978-3-642-29842-4.
A Two-Dimensional Lorentzian Distribution for an Atomic Force Microscopy Simulator Incollection
In: K. K. Sabelfeld; Ivan Dimov (Ed.): Monte Carlo Methods and Applications, pp. 97–104, De Gruyter, 2012, ISBN: 978-3-11-029347-0.
Towards a Free Open Source Process and Device Simulation Framework Incollection
In: The 15th International Workshop on Computational Electronics (IWCE), pp. 1–4, IEEE Xplore, 2012, ISBN: 978-1-4673-0705-5.
Inproceedings
Atomistic Study of 4H-SiC Using Ab Initio and Machine Learning Techniques (invited) Inproceedings
In: Joint International Meeting of The Electrochemical Society (ECS), The Electrochemical Society of Japan (ECSJ), and The Korean Electrochemical Society (KECS) - PRiME 2024, 2024.
Efficient Multi-Scale Modeling of Semiconductor Device Fabrication (invited) Inproceedings
In: Proceedings of the 5th International Congress on Advanced Materials Sciences and Engineering (AMSE), 2024.
Semiconductor Fabrication at Multiple Time and Length Scales (invited) Inproceedings
In: Proceedings of Austrochip - Workshop on Microelectronics, 2024.
Modeling and Simulation of ALD in a Level Set Framework (invited) Inproceedings
In: Proceedings of the 7th International Conference ALD for Industry, 2024.
Merging Reactor and Feature Scales for Plasma Etch Modeling (invited) Inproceedings
In: Proceedings of IEEE Nanotechnology Council - IEEE NANO 2024, 2024.
Multi-Scale Process TCAD for Advanced Semiconductor Fabrication Inproceedings
In: Book of Abstracts MESS24 - Microelectronic Systems Symposium, 2024.
Cluster-Based Model for Dopant Activation in SiC Inproceedings
In: Book of Abstracts MESS24 - Microelectronic Systems Symposium, 2024.
Multi-Scale Model for High Aspect Ratio TiN Etching in a Cl$_2$/Ar Inductively Coupled Plasma Inproceedings
In: Proceedings of the Plasma Processing and Technology International Conference (PlasmaTech), 2024.
Spline Interpolation-Based Multi-Scale Model for Etching in a Chlorine-Argon Inductively Coupled Plasma Inproceedings
In: Proceedings of the 20th International Conference on Modeling and Analysis of Semiconductor Manufacturing (MASM), 2024, (Part of Winter Simulation Conference (WSC)).
Modeling Non-Uniformity During Two-Step Dry Etching of Si/SiGe Stacks for Gate-All-Around FETs Inproceedings
In: 2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2024.
MD Simulation of Epitaxial Recrystallization and Defect Structure of Al-Implanted 4H-SiC Inproceedings
In: 2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2024.
Equipment-Informed Machine Learning-Assisted Feature-Scale Plasma Etching Model Inproceedings
In: 2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2024.
Impact of Ion Energy and Yield in Oblique Ion Beam Etching Process for Blazed Gratings Inproceedings
In: 2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2024.
Cluster-Based Multivariate Spline Model for Dopant Activation in SiC Inproceedings
In: Book of Abstracts AMaSiS 2024 - Applied Mathematics and Simulation for Semiconductor Devices, 2024.
Cluster-based semi-empirical model for dopant activation in silicon carbide Inproceedings
In: 2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2024.
Process Simulation in Micro- and Nano-electronics Inproceedings
In: IWCN - International Workshop on Computational Nanotechnology (2023), pp. 38-39, 2023, (Invited).
Reliability of Platinum Microheater Geometries for MEMS-Based Gas Sensors Inproceedings
In: Proceedings of the IEEE International Integrated Reliability Workshop (IIRW), pp. 1-6, IEEE, 2023, (International Integrated Reliability Workshop (IIRW), Fallen Leaf Lake, California (USA); 2022-10-09 -- 2022-10-13).
Modeling Plasma-Induced Damage During the Dry Etching of Silicon Inproceedings
In: Proceedings of the IEEE International Integrated Reliability Workshop (IIRW), pp. 1-5, IEEE, 2023, (International Integrated Reliability Workshop (IIRW), Fallen Leaf Lake, California (USA); 2022-10-09 -- 2022-10-13).
ViennaEMC: A Broadly-Applicable Ensemble Monte Carlo Framework Inproceedings
In: Abstract Booklet of the Workshop on Monte Carlo Simulation: Beyond Moore’s Law at the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 1, 2022, (Workshop on Monte Carlo Simulation: Beyond Moore’s Law at the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Granada, Spain; 2022-09-05).
DTCO Flow for Air Spacer Generation and its Impact on Power and Performance at N7 Inproceedings
In: Abstract Booklet of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 34-35, 2022, (International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Granada, Spain; 2022-09-06 -- 2022-09-08).
Modeling Non-Ideal Conformality during Atomic Layer Deposition in High Aspect Ratio Structures Inproceedings
In: Abstract Booklet of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 32-33, 2022, (International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Granada, Spain; 2022-09-06 -- 2022-09-08).
Study of Phonon-limited Electron Transport in Monolayer MoS2 Inproceedings
In: Proceedings of the International Conference on Microelectronic Devices and Technologies (MicDAT), pp. 74-78, 2022, (International Conference on Microelectronic Devices and Technologies (MicDAT), Corfu, Greece; 2022-09-21 -- 2022-09-23).
Impact of Mask Tapering on SF6/O2 Plasma Etching Inproceedings
In: Proceedings of the International Conference on Microelectronic Devices and Technologies (MicDAT), pp. 91-94, 2022, (International Conference on Microelectronic Devices and Technologies (MicDAT), Corfu, Greece; 2022-09-21 -- 2022-09-23).
Reliability and Stability of MEMS Microheaters for Gas Sensors Inproceedings
In: Proceedings of the IEEE International Integrated Reliability Workshop (IIRW), pp. 1-10, 2021, (International Integrated Reliability Workshop (IIRW), Fallen Leaf Lake, California (USA) - virtual; 2021-10-04 -- 2021-10-28).
Fast Model for Deposition in Trenches using Geometric Advection Inproceedings
In: Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 224–228, 2021, (International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Dallas, Texas (USA); 2021-09-27 -- 2021-09-29).
Combined Process Simulation and Emulation of an SRAM Cell of the 5nm Technology Node Inproceedings
In: Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 23–27, 2021, (International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Dallas, Texas (USA); 2021-09-27 -- 2021-09-29).
Gas Sensing with Two-Dimensional Materials Beyond Graphene Inproceedings
In: Proceedings of the International Conference on Microelectronics (MIEL), pp. 29–36, 2021, ISBN: 978-1-6654-4526-9, (invited; International Conference on Microelectronics (MIEL), Nis, Serbia; 2021-09-12 -- 2021-09-14).
Impact of High-Aspect-Ratio Etching Damage on Selective Epitaxial Silicon Growth in 3D NAND Flash Memory Inproceedings
In: Book of Abstracts of the Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), pp. 34–35, 2021, (Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Caen, France; 2021-09-01 -- 2021-09-03).
Modeling and Simulation of ALD in a Level Set Framework Inproceedings
In: Proceedings of the EFDS Workshop on Simulation for ALD, pp. 9, 2021, (invited; EFDS Workshop on Simulation for ALD, virtual; 2021-03-25).
Electromigration Model for Platinum Hotplates Inproceedings
In: Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 315–318, 2020, (International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Kobe, Japan - virtual; 2020-09-23 -- 2020-10-06).
Geometric Advection Algorithm for Process Emulation Inproceedings
In: Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 59–62, 2020, (International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Kobe, Japan - virtual; 2020-09-23 -- 2020-10-06).
Integration of Gas Sensors with CMOS Technology Inproceedings
In: Proceedings of the IEEE Electron Devices Technology and Manufacturing Conference (EDTM), pp. 294–297, 2020, ISBN: 978-1-7281-2539-8, (invited; IEEE Electron Devices Technology and Manufacturing Conference (EDTM), Penang, Malaysia - virtual; 2020-03-16 -- 2020-03-18).
Granularity Effects in Electromigration Inproceedings
In: Proceedings of the IEEE Latin America Electron Devices Conference (LAEDC), 2020, ISBN: 978-1-7281-1044-8, (invited; IEEE Latin America Electron Devices Conference (LAEDC), San Jose, Costa Rica; 2020-02-25 -- 2020-02-28).
CMOS-Compatible Gas Sensors Inproceedings
In: Proceedings of the International Conference on Microelectronics (MIEL), pp. 9–16, 2019, (invited; International Conference on Microelectronics (MIEL), Nis, Serbia; 2019-09-16 -- 2019-09-18).
Modeling and Simulation of Atomic Layer Deposition Inproceedings
In: Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 323–326, 2019, ISBN: 978-1-7281-0938-1, (International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Udine, Italy; 2019-09-04 -- 2019-09-06).
Process Simulation in the Browser: Porting ViennaTS using WebAssembly Inproceedings
In: Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 339–342, 2019, ISBN: 978-1-7281-0938-1, (International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Udine, Italy; 2019-09-04 -- 2019-09-06).
Electromigration in Nano-Interconnects Inproceedings
In: Book of Abstracts of the Workshop on High Performance TCAD (WHPTCAD), pp. 2, 2019, (invited; Workshop on High Performance TCAD (WHPTCAD), Chicago, IL, USA; 2019-05-24 -- 2019-05-25).
Fast Volume Evaluation on Sparse Level Sets Inproceedings
In: Book of Abstracts of the International Workshop on Computational Nanotechnology (IWCN), pp. 113–114, 2019, ISBN: 978-3-9504738-0-3, (International Workshop on Computational Nanotechnology (IWCN), Chicago, IL, USA; 2019-05-20 -- 2019-05-24).
CMOS Compatible Gas Sensors Inproceedings
In: Book of Abstracts of the International Conference on Materials Science and Engineering, 2019, (invited; International Conference on Materials Science and Engineering, San Francisco, CA, USA; 2019-02-18 -- 2019-02-20).
Modeling the Influence of Grains and Material Interfaces on Electromigration Inproceedings
In: Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 83–87, 2018, ISBN: 978-1-5386-6788-0, (International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Austin, Texas, USA; 2018-09-24 -- 2018-09-26).
Enhanced Sensing Performance of Integrated Gas Sensor Devices Inproceedings
In: Proceedings of EUROSENSORS 2018, 2018, ISBN: 978-3-00-025217-4, (EUROSENSORS, Graz, Austria; 2018-09-09 -- 2018-09-12).
System-on-Chip Sensor Integration in Advanced CMOS Technology Inproceedings
In: Proceedings of the 233textsuperscriptrd ECS Meeting (ECS), 2018, ISSN: 2151-2043, (invited; 233textsuperscriptrd ECS Meeting (ECS), Seattle, Washington, USA; 2018-05-13 -- 2018-05-17).
CMOS-Compatible Semiconductor-Based Gas Sensors Inproceedings
In: Book of Abstracts of Emerging Technologies Communication Microsystems Optoelectronics Sensors, 2018, (invited; Emerging Technologies Communication Microsystems Optoelectronics Sensing (ETCMOS), Whistler, British Columbia, Canada; 2018-05-09 -- 2018-05-11).
Unified Feature Scale Model for Etching in SF6 and Cl Plasma Chemistries Inproceedings
In: Book of Abstracts of the Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), pp. 65–66, 2018, ISBN: 978-1-5386-4810-0, (Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Granada, Spain; 2018-03-19 -- 2018-03-21).
Modeling Electromigration in Nanoscaled Copper Interconnects Inproceedings
In: Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 161–164, 2017, ISBN: 978-4-86348-612-6, (International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Kamakura, Japan; 2017-09-07 -- 2017-09-09).
Numerical Aspects of the Deterministic Solution of the Wigner Equation Inproceedings
In: Book of Abstracts of the International Wigner Workshop (IW2), pp. 42–43, Institute for Microelectronics, TU Wien, 2017, ISBN: 978-3-200-05129-4, (International Wigner Workshop (IW2), Low Wood Bay, Lake District, UK; 2017-06-05).
Using One-Dimensional Radiosity to Model Neutral Flux in Convex High Aspect Ratio Structures Inproceedings
In: Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 265–268, 2016, ISBN: 978-1-5090-0817-9, (International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Nürnberg, Deutschland; 2016-09-06 -- 2016-09-08).
Effects of the Deposition Process Variation on the Performance of Open TSVs Inproceedings
In: Proceedings of IEEE Electronic Components and Technology Conference (ECTC), pp. 2188–2195, 2016, ISBN: 978-1-5090-1204-6, (IEEE Electronic Components and Technology Conference (ECTC), Las Vegas, NV, USA; 2016-05-31 -- 2016-06-03).